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电弧离子镀脉冲负偏压电源负载特性的仿真分析
引用本文:戚栋,王宁会,林国强,丁振峰.电弧离子镀脉冲负偏压电源负载特性的仿真分析[J].电气应用,2002(11):10-11,23.
作者姓名:戚栋  王宁会  林国强  丁振峰
作者单位:大连理工大学电气工程系,116024
摘    要:通过等离子体物理理论和仿真分析 ,明确了电弧离子镀的等离子体负载本质是等离子体鞘层引起的容性负载 ,探讨了电弧离子镀脉冲负偏压电源的设计方法。

关 键 词:电弧离子镀  脉冲负偏压电源  负载特性  仿真
修稿时间:2002年6月24日

Simulation Analysis of Load Characteristics of Arc Deposition Pulsed-bias Power
Qi Dong.Simulation Analysis of Load Characteristics of Arc Deposition Pulsed-bias Power[J].Electrotechnical Application,2002(11):10-11,23.
Authors:Qi Dong
Affiliation:Dalian University of Technology
Abstract:Based on the experiment result of pulse negative bias power of that voltage frequency and duty ratio can be changed smoothly working on the arc deposition device,established the simulate model of arc deposition pulsed bias power,studied the load characteristics of pulse power under the condition of different frequency,duty ratio and matched resistance By the plasma physics theory and simulate analysis,determined that the nature of arc deposition's plasma load is capacitance load that is caused by plasma sheath,discussed the design method of pulse negative bias voltage power
Keywords:arc deposition  pulse  negative  bias power  load characteristics  simulation
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