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| 磁约束微波等离子体化学气相沉积金刚石薄膜 | |
| 引用本文： | 孙亦宁,恽辉中,杨基南,廖佐升,吴京波,魏庆生. 磁约束微波等离子体化学气相沉积金刚石薄膜[J]. 微细加工技术, 1992, 0(2) |
| 作者姓名： | 孙亦宁 恽辉中 杨基南 廖佐升 吴京波 魏庆生 |
| 作者单位： | 兰州物理研究所，兰州物理研究所，长沙半导体工艺设备研究所，长沙半导体工艺设备研究所，长沙半导体工艺设备研究所，长沙半导体工艺设备研究所 兰州 730000，兰州 730000，长沙 410111，长沙 410111，长沙 410111，长沙 410111 |
| 摘 要： | 采用国内研制的电子回旋共振化学气相沉积(ECRCVD)设备,在单晶硅衬底上沉积了金刚石薄膜。通过扫描电子显微镜(SEM)、X射线衍射仪(XRD)和激光拉曼谱仪(RAM)的测试,证明所沉积的薄膜具有明确的金刚石特征。所采用的ECRCVD设备,具有低压沉积、大面积均匀和低温生长的优点。这种方法在合成金刚石光学膜、半导体膜以及其它薄膜方面,很有发展潜力。 |
| 关 键 词： | 金刚石薄膜 化学气相沉积(CVD) 电子回旋共振(ECR) |
DEPOSITON OF DIAMOND THIN FILM BY MAGNETO-BOUND MICROWAVE PLASMA CVD |
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| Sun Yiening,Yun Huizhong. DEPOSITON OF DIAMOND THIN FILM BY MAGNETO-BOUND MICROWAVE PLASMA CVD[J]. Microfabrication Technology, 1992, 0(2) | |
| Authors: | Sun Yiening Yun Huizhong |
| Abstract: | Diamond thin films were successfully deposited on single - crystal Si substrate at low pressure by a homemade equipment of electron cyclotron resonance chemical vapor deposition (ECRCVD) . The diamond properties of the films were surely confirmed by the tests of Scan Electron Microscopy (SEM), X-Ray Diffraction (XRD) and Raman Spectroscopy (RAM) . The ECRCVD system has many advantages in respect of low operating pressure, low substrate temperature and large depositing area. An potential application to synthesize diamond optical film, miconductor film and other kinds of films is certainly prospectire. |
| Keywords: | diamond film chemical vapor deposition (CVD) electon cyclotron resonance (ECR) |
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