Natively textured surface aluminum-doped zinc oxide transparent conductive layers for thin film solar cells via pulsed direct-current reactive magnetron sputtering |
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Authors: | Xin-liang Chen Lin-na LiFei Wang Jian NiXin-hua Geng Xiao-dan ZhangYing Zhao |
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Affiliation: | Institute of Photo-electronic Thin Film Devices and Technology, Nankai University, Tianjin 300071, People's Republic of China Tianjin Key laboratory of Photo-electronic Thin Film Devices and Technology, Nankai University, Tianjin 300071, People's Republic of China Key laboratory of Opto-electronic Information Science and Technology for Ministry of Education, Nankai University, Tianjin 300071, People's Republic of China |
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Abstract: | Natively textured surface aluminum-doped zinc oxide (ZnO:Al) layers for thin film solar cells were directly deposited without any surface treatments via pulsed direct-current reactive magnetron sputtering on glass substrates. Such an in-situ texturing method for sputtered ZnO:Al thin films has the advantages of efficiently reducing production costs and dramatically saving time in photovoltaic industrial processing. High purity metallic Zn-Al (purity: 99.999%, Al 2.0 wt.%) target and oxygen (purity: 99.999%) were used as source materials. During the reactive sputtering process, the oxygen gas flow rate was controlled using plasma emission monitoring. The performance of the textured surface ZnO:Al transparent conductive oxides (TCOs) thin films can be modified by changing the number of deposition rounds (i.e. thin-film thicknesses). The initially milky ZnO:Al TCO thin films deposited at a substrate temperature of ~ 553 K exhibit rough crater-like surface morphology with high transparencies (T ~ 80-85% in visible range) and excellent electrical properties (ρ ~ 3.4 × 10− 4 Ω cm). Finally, the textured-surface ZnO:Al TCO thin films were preliminarily applied in pin-type silicon thin film solar cells. |
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Keywords: | Zinc oxide Thin films Transparent conductive oxides Magnetron sputtering Textured surface Solar cells |
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