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系统压强对微波等离子体化学气相沉积金刚石成核的影响
引用本文:王志明,夏义本,杨莹,方志军,王林军,居建华,张伟丽,范轶敏.系统压强对微波等离子体化学气相沉积金刚石成核的影响[J].功能材料与器件学报,2001,7(3):326-329.
作者姓名:王志明  夏义本  杨莹  方志军  王林军  居建华  张伟丽  范轶敏
作者单位:上海大学材料科学与工程学院,
摘    要:为了在氧化铝上制备(100)定向织构的金刚石薄膜,必须先提高金刚石的成核密度,在微波等离子体化学气相沉积(MPCVD)系统中,采用低压成核的方法,在氧化铝陶瓷上沉积出高成核密度的金刚石薄膜,扫描电镜显示其成核密度可达10^8cm^-2。在此基础上,沉积出(100)织构的金刚石薄膜。

关 键 词:MPCVD  金刚石膜  氧化铝  气体压力  成核密度
文章编号:1007-4252(2001)03-0326-04
修稿时间:2000年10月18

Influence of pressure on nucleation of diamond by microwave plasma enhanced chemical vapor deposition synthesis
WANG Zhi-ming,XIA Yi-ben,YANG Ying,FANG Zhi-jun,WANG Lin-jun,JU Jian-hua,ZHANG Wei-li,FAN Yi-min.Influence of pressure on nucleation of diamond by microwave plasma enhanced chemical vapor deposition synthesis[J].Journal of Functional Materials and Devices,2001,7(3):326-329.
Authors:WANG Zhi-ming  XIA Yi-ben  YANG Ying  FANG Zhi-jun  WANG Lin-jun  JU Jian-hua  ZHANG Wei-li  FAN Yi-min
Abstract:In order to grow diamond film on alumina ceramic, it is essential to control the diamond nucleation properly. Under gas pressure lower than that used for growth, the high density nucleation of diamond films on alumina was successfully achieved by microwave plasma-enhanced chemical vapor deposition (MPCVD). Observation of SEM demonstrated that the nuclear density could be as high as 108/cm2. Based on this, 100]-textured diamond film was successfully deposited on alumina ceramic.
Keywords:MPCVD  diamond film  alumina substrates  gas pressure  nucleation density  
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