铌酸锂干法刻蚀的研究进展

概述了近年来国内外对铌酸锂(LN)晶体干法刻蚀技术的研究进展。根据刻蚀原理和特点,现有的LN干法刻蚀技术可分为等离子体刻蚀、激光微加工技术和Ti扩散电化学刻蚀。对各刻蚀方法及其研究进展进行了总结,分析了不同干法刻蚀方法之间的区别和联系,并对各方法中存在的问题进行了探讨。其中等离子体刻蚀技术由于其良好的图形转移特性,得到了最广泛的应用;激光微加工技术在制备光子晶体结构和微光栅结构中具有独特的优势;Ti扩散电化学刻蚀LN为制备大尺寸的LN基结构指明了新的方向。

Research Development on LiNbO3 Dry Etching

The dry etching technology for lithium niobate(LN) crystal is reviewed.According to the etching mechanism and characteristics,the existing LN dry etching methods can be classified as the plasma etching,laser micromachining technique and Ti diffusion electrochemical etching.The etching methods and research progress are summarized.The difference and relationship of the different etching methods are analyzed,and the problems of the etching methods are discussed.The plasma etching technology is most widely used because of its excellent pattern transfer characteristics.The laser micromachining technique has the unique advantages in the preparation of the photonic crystal structure and micro-grating structure.The Ti diffusion electrochemical etching indicates a new development direction for the fabrication of large scale pattern on LN.