|
|||||
|
|
| ITO透明导电薄膜的研究进展 | |
| 引用本文： | 成立顺,孙本双,钟景明,何力军,王东新,陈焕铭.ITO透明导电薄膜的研究进展[J].稀有金属快报,2008,27(3):10-16. |
| 作者姓名： | 成立顺 孙本双 钟景明 何力军 王东新 陈焕铭 |
| 作者单位： | 1. 宁夏大学,宁夏,银川,750021;西北稀有金属材料研究院,宁夏,石嘴山,753000 2. 西北稀有金属材料研究院,宁夏,石嘴山,753000 3. 宁夏大学,宁夏,银川,750021 |
| 摘 要： | 介绍了ITO薄膜的基本特性和透明导电原理，综述了ITO薄膜主要的制备技术及其研究进展，并指出了不同制备方法的优缺点。还对ITO薄膜晶格常数畸变、载流子浓度上限和最佳掺杂量、红外反射率、光吸收边的移动等基础理论研究进展进行了归纳。今后，还需要在低温或室温ITO薄膜的制备、ITO薄膜的导电机理、纳米尺度ITO材料的特性等方面加强研究。 |
| 关 键 词： | 透明导电氧化物 ITO薄膜 制备技术 |
| 文章编号： | 1008-5939(2008)03-010-07 |
| 修稿时间： | 2007年12月26 |
Development of ITO Transparent and Conductive Thin Films |
|
| Cheng Lishun,Sun Benshuang,Zhong Jingming,He Lijun,Wang Dongxin,Chen Huanming.Development of ITO Transparent and Conductive Thin Films[J].Rare Metals Letters,2008,27(3):10-16. | |
| Authors: | Cheng Lishun Sun Benshuang Zhong Jingming He Lijun Wang Dongxin Chen Huanming |
| Affiliation: | Cheng Lishun, Sun Benshuang, Zhong Jingmin, He Lijun, Wang Dongxin, Chen Huanming (1. Ningxia University, Yinchuan 750021, China;2. Northwest Rare Metal Materials Research Institute, Shizuishan 753000, China) |
| Abstract: | The type of transparent and conductive thin films is reviewed briefly. And the properties, applications, transparent and conductive principles and fabrication techniques of ITO films are also summarized in the paper. The advantages and disadvantages a- mong several fabrication techniques are compared. Meanwhile, the theoretical developments including lattice distortion, limitation of carrier concentration, the optimum content of dopant, infrared emissivity and shift of optical absorption edge of ITO films are summed up. Finally, the research on the unconventional applications and the further development of ITO thin films is discussed. |
| Keywords: | TCO ITO thin films fabrication technique |
| 本文献已被 维普 万方数据 等数据库收录！ | |