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| 利用合适的相干因子提高光刻仿真准确性(英文) | |
| 引用本文： | 高少文,李小平,何乐,储兆祥,张强. 利用合适的相干因子提高光刻仿真准确性(英文)[J]. 电子工业专用设备, 2005, 34(12): 59-64 |
| 作者姓名： | 高少文 李小平 何乐 储兆祥 张强 |
| 作者单位： | 上海微电子装备有限公司,上海,201203 |
| 摘 要： | 利用光刻仿真软件PROLITH,进行了掩模版空间成像的焦深(DOF)和光学临近效应的 仿真。理论上分析了照明光瞳相干因子定义法:10％能量法和10％-90％积分能量法,并发展了因 子矫正法。仿真中分别代入了这三种定义法得到的照明光瞳相干因子,通过比较这三种情况与代 入真实光瞳的仿真结果,发现利用因子矫正法定义真实照明光瞳的相干因子,比其它两种定义法 得到的仿真结果与真实结果最接近,从而提高了仿真的准确性。 |
| 关 键 词： | 光刻 仿真 PRIOLITH 相干因子 光瞳 |
| 文章编号： | 1004-4507(2005)12-0059-06 |
| 收稿时间： | 2005-11-14 |
| 修稿时间： | 2005-11-14 |
Enhance Lithography Simulation Accuracy with Appropriate Coherence Factors |
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| GAO Shao-wen,LI Xiao-ping,HE Le,CHU Zhao-xiang,ZHANG Qiang. Enhance Lithography Simulation Accuracy with Appropriate Coherence Factors[J]. Equipment for Electronic Products Marufacturing, 2005, 34(12): 59-64 | |
| Authors: | GAO Shao-wen LI Xiao-ping HE Le CHU Zhao-xiang ZHANG Qiang |
| Affiliation: | SMEE technique department, Shanghai, 201203, China |
| Abstract: | The aerial image qualities of depth of focus (DOF) and optical proximity effect are simulated with the lithography simulation software PROLITH. The lithographic simulation accuracy has also been analyzed with three coherence factor calculation methods: 10% intensity method, 10%-90% integrated intensity method and factor correction method. The results show that the coherence factor of a real pupil fill profile defined by factor correction method makes lithographic prediction more accurate than by the other two methods in PROLITH, thus enhances the simulation accuracy. |
| Keywords: | Microlithography Simulation PROLITH Coherence factor Pupil fill |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ | |