CVD Mullite Coatings in High-Temperature, High-Pressure Air–H2O |
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Authors: | J. Allen Haynes Michael J. Lance Kevin M. Cooley Mattison K. Ferber Richard A. Lowden David P. Stinton |
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Affiliation: | Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831–6063 |
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Abstract: | Crystalline mullite was deposited by chemical vapor deposition (CVD) onto SiC/SiC composites overlaid with CVD SiC. Specimens were exposed to isothermal oxidation tests in high-pressure air + H2O at 1200°C. Unprotected CVD SiC formed silica scales with a dense amorphous inner layer and a thick, porous, outer layer of cristobalite. Thin coatings (∼2 μm) of dense CVD mullite effectively suppressed the rapid oxidation of CVD SiC. No microstructural evidence of mullite volatility was observed under these temperature, pressure, and low-flow-rate conditions. Results of this preliminary study indicate that dense, crystalline, high-purity CVD mullite is stable and protective in low-velocity, high-pressure, moisture-containing environments. |
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Keywords: | chemical vapor deposition mullite coatings |
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