| Ni/Si体系离子束混合及相变研究 |
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| 引用本文： | 毛思宁,杨熙宏,陈坚,刘家端,杨锋,王玗.Ni/Si体系离子束混合及相变研究[J].核技术,1988(3). |
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| 作者姓名： | 毛思宁 杨熙宏 陈坚 刘家端 杨锋 王玗 |
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| 作者单位： | 北京大学，北京大学，北京大学，中国科学院物理研究所，中国科学院物理研究所，中国科学院物理研究所 清华大学物理系 |
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| 摘 要： | 注入参量变化引起不同的混合结果,在宽温区中得到Ni_2Si、NiSi、NiSi_2多种化合物相,进而探讨了Xe离子诱导的Ni/Si体系界面原子混合机理及诱发相变的动力学过程。
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| 关 键 词： | 离子束混合 Ni/Si体系相变 |
The investigation of ion beam mixing and phase transformation in Ni/Si system |
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| Mao Sining Yang Xihong Chen Jian.The investigation of ion beam mixing and phase transformation in Ni/Si system[J].Nuclear Techniques,1988(3). |
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| Authors: | Mao Sining Yang Xihong Chen Jian |
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| Abstract: | The nickel silicide phases produced by ion beam mixing were investigated. Ni2Si, NiSi and NiSi2 phases were obtained with different implantation parameters. The dynamic process of phase transformation and the mechanism of ion beam mixing were also discussed. |
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| Keywords: | ion beam mixing phase transformation of Ni/Si system |
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