首页 | 本学科首页   官方微博 | 高级检索  
     


Hillock and Whisker Growth on Sn and SnCu Electrodeposits on a Substrate Not Forming Interfacial Intermetallic Compounds
Authors:ME Williams  K-W Moon  WJ Boettinger  D Josell  AD Deal
Affiliation:(1) Metallurgy Division, NIST, Gaithersburg, MD 20899, USA;(2) Department of Materials Science & Engineering, Lehigh University, Bethlehem, PA 18015, USA
Abstract:Intermetallic compound (IMC) formation at the interface between the tin (Sn) plating and the copper (Cu) substrate of electronic components has been thought to produce compressive stress in Sn electrodeposits and cause the growth of Sn whiskers. To determine if interfacial IMC is a requirement for whisker growth, bright Sn and a Sn-Cu alloy were electroplated on a tungsten (W) substrate that does not form interfacial IMC with the Sn or Cu. At room temperature, conical Sn hillocks grew on the pure Sn deposits and Sn whiskers grew from the Sn-Cu alloy electrodeposits. These results demonstrate that interfacial IMC is not required for initial whisker growth.
Keywords:Interfacial intermetallic compound (IMC)  tin whiskers  focused ion beam (FIB)
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号