Numerical analysis of transmission coefficient,LDOS, and DOS in superlattice nanostructures of cubic $$\hbox {Al}_{x}\hbox {Ga}_{1-x}\hbox {N/GaN}$$ resonant tunneling MODFETs

Numerical analysis of the transmission coefficient, local density of states, and density of states in superlattice nanostructures of cubic \(\hbox {Al}_{x}\hbox {Ga}_{1-x}\hbox {N/GaN}\) resonant tunneling modulation-doped field-effect transistors (MODFETs) using \(\hbox {next}{} \mathbf{nano}^{3}\) software and the contact block reduction method is presented. This method is a variant of non-equilibrium Green’s function formalism, which has been integrated into the \(\hbox {next}\mathbf{nano}^{3}\) software package. Using this formalism in order to model any quantum devices and estimate their charge profiles by computing transmission coefficient, local density of states (LDOS) and density of states (DOS). This formalism can also be used to describe the quantum transport limit in ballistic devices very efficiently. In particular, we investigated the influences of the aluminum mole fraction and the thickness and width of the cubic \(\hbox {Al}_{x}\hbox {Ga}_{1-x}\hbox {N}\) on the transmission coefficient. The results of this work show that, for narrow width of 5 nm and low Al mole fraction of \(x = 20\,\%\) of barrier layers, cubic \(\hbox {Al}_{x}\hbox {Ga}_{1-x}\hbox {N/GaN}\) superlattice nanostructures with very high density of states of 407 \(\hbox {eV}^{-1}\) at the resonance energy are preferred to achieve the maximum transmission coefficient. We also calculated the local density of states of superlattice nanostructures of cubic \(\hbox {Al}_{x}\hbox {Ga}_{1-x}\hbox {N/GaN}\) to resolve the apparent contradiction between the structure and manufacturability of new-generation resonant tunneling MODFET devices for terahertz and high-power applications.