Fabrication of a novel micron scale Y-structure-based chiral metamaterial: Simulation and experimental analysis of its chiral and negative index properties in the terahertz and microwave regimes |
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Authors: | Wongkasem Nantakan Akyurtlu Alkim Marx Kenneth A Goodhue William D Li Jin Dong Qi Ada Earl T |
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Affiliation: | Department of Electrical and Computer Engineering, University of Massachusetts Lowell, Lowell, Massachusetts 01854, USA. |
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Abstract: | In this report, we describe the fabrication of a chiral metamaterial based on a periodic array of Y-shaped Al structures on a dielectric Mylar substrate. The unit cell dimensions of the Y-structure are approximately 100 microm on a side with 8 microm linewidths. The fabricated Y-structure elements are characterized using scanning electron microscopy (SEM) and atomic force microscopy (AFM). Quantitative elemental analyses were carried out on both the Y-structure, comprised of Al and its oxide, as well as adjacent regions of the underlying mylar substrate using the energy dispersive X-ray spectroscopy (EDS) capability of the SEM. Finite-Difference Time-Domain (FDTD) calculations of the negative index of refraction for a 3D wedge of multiple layers of the 2D metamaterials showed that these metamaterials possess double negative (-mu,-epsilon) electromagnetic bulk properties at THz frequencies. The same negative index of refraction was determined for a wedge comprised of appropriately scaled larger Y-structures simulated in the microwave region. This double negative property was confirmed experimentally by microwave measurements on a 3D wedge comprised of stacked and registered Y-structure sheets. |
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Keywords: | metamaterials chirality fabrication lithography terahertz microwave negative index of refraction finite‐difference time‐domain simulations Y‐structure |
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