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The Role of oxygen diffusion in photoinduced changes of the electronic and optical properties in amorphous indium oxide
Authors:B. Claflin  H. Fritzsche
Affiliation:(1) James Franck Institute and Department of Physics, The University of Chicago, 5640 South Ellis Ave., 60637 Chicago, IL;(2) Present address: Department of Physics, North Carolina State University, Box 8202, 27695 Raleigh, NC
Abstract:
A stable increase by as much as 108 in the conductivity of amorphous indium oxide to σ≥ 103-1 cm−1 can be achieved by ultraviolet photoreduction. This treatment also increases the absorption coefficient, α(hυ), by up to a factor of 103 for hυ <1.5 eV due to free carrier absorption and causes a 0.1 eV shift of the absorption edge to the blue. These changes are controlled by the Fermi level, EF, which is presumably determined by doping due to oxygen vacancies. A diffusion constant D >3 x 10−12 cm2/s for oxygen at 300K is determined from a constant flow experiment. Oxygen diffusion is verified by secondary ion mass spectrometry with 18O. The functions α(hυ) and σ(T) are simulated as EF is varied using a simple density of states model appropriate for amorphous semiconductors. These simulations qualitatively agree with the experimental data if transitions from the conduction band tail to the conduction band are assumed to be forbidden.
Keywords:Amorphous indium oxide  Metal-insulator transition  Optical absorption  Oxygen diffusion  Photoreduction  Secondary ion mass spectrometry (SIMS)  Transparent conductors
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