Analysis of the Molecular Structure at the PPS/Copper Interphase and its Role in Adhesion |
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Authors: | H. F. Webster J. P. Wightman T. W. Johnson |
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Affiliation: | a Department of Chemistry, Virginia Polytechnic Institute and State University, Blacksburg, Virginia, USAb Phillips Research Center, Phillips Petroleum Company, Bartlesville, Oklahoma, USA |
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Abstract: | ![]() X-ray photoelectron spectroscopy (XPS) was used to examine the interfacial chemistry in polyphenylene sulfide (PPS)/copper bonded laminates. Several surface pretreatments were studied including a simple methanol wash, two acid etches, thermal oxidation and chemical oxidation. Peel test analysis showed poor adhesion to the methanol-washed and acid-etched foils, giving a peel strength of only 3-5 g/mm. XPS analysis of the failure surfaces revealed a large amount of inorganic sulfide at the interface with reduction of the copper oxide. Chemical oxidation using an alkaline potassium persulfate solution gave a matt-black surface consisting of primarily cupric oxide. These samples showed improved adhesion and XPS analysis of the failure surfaces revealed fracture through a mixed PPS/cuprous oxide layer. A simple thermal oxidation yielded a cuprous oxide surface layer and laminates bonded to these surfaces showed a more than ten-fold increase in peel strength. XPS analysis of the failure surfaces showed much lower amounts of interfacial copper sulfide and it was postulated that excess sulfide at the interface was responsible for the poor adhesion observed for other pretreatments. |
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Keywords: | polyphenylene sulfide copper adhesion interphase copper sulfide x-ray photoelectron spectroscopy peel strength surface pretreatment cuprous oxide cupric oxide |
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