| S枪磁控溅射淀积非晶硅光电导薄膜的制备工艺及特性研究 |
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| 引用本文： | 朱振才,顾培夫,唐晋发.S枪磁控溅射淀积非晶硅光电导薄膜的制备工艺及特性研究[J].激光与红外,1992(5). |
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| 作者姓名： | 朱振才 顾培夫 唐晋发 |
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| 作者单位： | 浙江大学光电与科仪系，浙江大学光电与科仪系，浙江大学光电与科仪系 杭州 310027，杭州 310027，杭州 310027 |
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| 摘 要： | 本文介绍用直流磁控S枪在H_2/Ar混合气体中反应溅射单晶硅靶淀积a-Si:H光电导薄膜的制备工艺。研究了用这种技术制备的a-Si:H薄膜的光学特性(透射率光谱、光学常数和光学带隙等)、晶相结构(用电子衍射图谱)、红外吸收光谱和光电导性能。并讨论了制备工艺条件与薄膜微结构和性能的关系。
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| 关 键 词： | 磁控溅射 光电导薄膜 |
Preparation and Properties of Hydrogenated Amorphous Silicon Photoconductive Films Deposited by DC S-gun Magnetron Sputtering |
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| Zhu Zhencai Gu Peifu Tang Jinfa.Preparation and Properties of Hydrogenated Amorphous Silicon Photoconductive Films Deposited by DC S-gun Magnetron Sputtering[J].Laser & Infrared,1992(5). |
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| Authors: | Zhu Zhencai Gu Peifu Tang Jinfa |
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| Abstract: | The preparation and sputtering characteristics of hydrogenated amorphous silicon(a-Si: H) by DC S-gun magnetron sputtering of a monocrystalline silicon target in H_2/Ar plasma (reactive sputtering) have been studied. Optical properties including transmission spectra, optical constants and optical band gap, crystalline structure, infrared spectrometry and photoconductivity of the films deposited by S-gun magnetron sputtering were measured and studied. The dependence of the microstructure and properties of a-Si: H films on the deposition. conditions has also been discussed. |
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| Keywords: | magnetron sputtering photoconductive films |
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