| GH4169合金气体渗氮工艺研究 |
| |
| 引用本文： | 陈昭运,陈忠华,李志强.GH4169合金气体渗氮工艺研究[J].金属热处理,2009,34(7). |
| |
| 作者姓名： | 陈昭运 陈忠华 李志强 |
| |
| 作者单位： | 哈尔滨工程大学,材料科学与化工学院,黑龙江,哈尔滨,150001 |
| |
| 摘 要： | 利用光学显微镜(OM)、扫描电镜(SEM)、透射电镜(TEM)、X射线衍射仪(XRD)、能谱仪(EDS)、显微硬度仪等分析手段,对GH4169合金的渗氮机理及长时间气体渗氮后渗氮层和基体组织、成分、性能进行了分析.结果表明,GH4169合金渗氮层深度和渗氮时间符合抛物线规律,长时间气体渗氮后渗层中会析出均匀细小的CrN(尺寸在纳米级)、Cr7C3相.渗氮层硬度达到1 268 HV0.05,渗氮层较脆,裂纹易沿原始γ相晶界萌生并扩展.
|
| 关 键 词： | GH4169合金 气体渗氮 |
Study on gas nitriding process of GH4169 alloy |
| |
| CHEN Zhao-yun,CHEN Zhong-hua,LI Zhi-qiang.Study on gas nitriding process of GH4169 alloy[J].Heat Treatment of Metals,2009,34(7). |
| |
| Authors: | CHEN Zhao-yun CHEN Zhong-hua LI Zhi-qiang |
| |
| Affiliation: | College of Materials Science and Chemical Engineering;Harbin Engineering University;Harbin Heilongjiang 150001;China |
| |
| Abstract: | The mechanism of gas nitriding,microstructure,composition and properties of substrate and nitride layer of GH4169 alloy were analyzed with optical microscopy(OM),scanning electron microscopy(SEM),transmission electron microscopy(TEM),X-ray diffractometer(XRD),energy disperse spectroscopy(EDS)and microhardometer after long time gas nitriding.The results show that relationship of the nitriding layer depth and nitriding time obeys parabolic law.After long time gas nitriding,fine and uniformly distributed CrN(i... |
| |
| Keywords: | GH4169 alloy gas nitriding |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
