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Fabrication of room temperature continuous-wave operation GaN-based ultraviolet laser diodes
Authors:Jing Yang  Zongshun Liu  Ping Chen  Jianjun Zhu  Desheng Jiang  Yongsheng Shi  Hai Wang  Lihong Duan  Liqun Zhang  Hui Yang
Affiliation:1. State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;2. Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, China
Abstract:Two kinds of continuous-wave GaN-based ultraviolet laser diodes (LDs) operated at room temperature and with different emission wavelengths are demonstrated.The LDs epitaxial layers are grown on GaN substrate by metalorganic chemical vapor deposition,with a 10 × 600 μm2 ridge waveguide structure.The electrical and optical characteristics of the ultraviolet LDs are investigated under direct-current injection at room temperature.The stimulated emission peak wavelength of first LD is 392.9 nm,the threshold current density and voltage is 1.5 kA/cm2 and 5.0 V,respectively.The output light power is 80 mW under the 4.0 kA/cm2 injection current density.The stimulated emission peak wavelength of second LD is 381.9 nm,the threshold current density the voltage is 2.8 kA/cm2 and 5.5 V,respectively.The output light power is 14 mW under a 4.0 kA/cm2 injection current density.
Keywords:GaN-based ultraviolet laser diodes  continuous-wave operation  threshold current
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