Thermochromic properties of vanadium oxide films prepared by dc reactive magnetron sputtering |
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Authors: | Hai-Ning Cui Vasco Teixeira Rong Wang Elvira Fortunato |
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Affiliation: | a College of Physics, JiLin University, 2519 JieFangDaLu Road, 130021 ChangChun, PR China b Centro de Física e Departamento de Física, Universidade do Minho, 4710 Braga, Portugal c Departamento de Física, Instituto Superior de Engenharia do Porto, Rua de São Tomé, 4200 Porto, Portugal d Dept. Ciência dos Materiais, CENIMAT, Faculdade de Ciências e Tecnologia da Universidade Nova de Lisboa, PT-2829-516 Caparica, Portugal |
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Abstract: | A transparent vanadium oxide film has been one of the most studied electrochromic (EC) and Thermochromic (TC) materials. Vanadium oxide films were deposited at different substrate temperatures up to 400 °C and different ratios of the oxygen partial pressure (PO2). SEM, AFM and X-ray diffraction's results show detail structure data of the films. IR mode assignments of the films measured by IR reflection-absorbance in NGIA (near grazing incidence angle) are given. It is found that the film has V2O5 and VO2 combined structures. The films exhibit clear changes in transmittance when the environment temperature (Te) is varied, especially in the 3600-4000 cm− 1 range. Applying a Te that is higher than a critical temperature (Tc) to the samples, the as-RT (room temperature) deposited film with 9% PO2 has a transmittance variation of 30%, but the films that were deposited on a heated substrate of 400 °C have little variation. There is tendency of bigger variation in transmittance for the sample deposited at a larger PO2, when it is applied by 200 °C Te. |
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Keywords: | Vanadium oxide films Thermochromic property XRD IR dc magnetron sputtering |
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