超声场中电沉积制备纳米晶Ni-SiO2

于恒定功率超声场中,采用优选的电沉积工艺参数,制备出纳米晶Ni-SiO2复合层。借助显微硬度计和质量损失法测定复合层的性能。结果表明,显微硬度和耐酸性均较常规Ni-SiO2复合层提高,但受阴极电流密度影响明显。随阴极电流密度增加(2~14 A/dm2),显微硬度近似呈线性增大趋势,最高达461.3 HV,耐酸性先改善后削弱,在10%HCl溶液中的腐蚀速度从0.008 8 mg/mm2.d减至0.007 1 mg/mm2.d后增至0.009 3 mg/mm2.d,在10%H2SO4溶液中的腐蚀速度从0.008 1 mg/mm2.d减至0.006 6 mg/mm2.d后增至0.008 2 mg/mm2.d。

Nanocrystalline Ni-SiO2 Electrodeposited in Ultrasound Field

Nanocrystalline Ni-SiO2 composite coating was electrodeposited in constant power ultrasound field using the selected process parameters, and its properties were determinated and studied reposing on microhardness tester and quality loss method. The results show that microhardness and acid resistance were both improved when comparing with conventional Ni-SiO2 composite coating, but they were obviously influenced by cathode current density. As the cathode current density increases from 2 to 14A/dm2,the microhardness, as a whole, approximate linearity increased up to 461.3 HV. However, the acid resistance improved first and then weakened, the corrosion rate, decreases from 0.0088 mg/mm2.d to 0.0071 mg/mm2.d and then increases to 0.0093 mg/mm2.d in 10 wt. % HCl solution, and decreases from 0.0081 mg/mm2.d to 0.0066 mg/mm2.d then increases to 0.0082 mg/mm2.d in 10 wt. % H2SO4 solution.