无电流电场沉积CdS纳米薄膜

针对普通电沉积制备纳米薄膜工艺中的电极析气、电解、电镀等有害电极反应对沉积过程和沉积膜造成不良影响的问题,提出了一种待沉积薄膜的基材及其上的沉积膜不与沉积电路组成闭合电流回路的电场沉积装置及电场沉积制备纳米薄膜的新方法.在自制的电场沉积装置上制备了CdS薄膜并用AFM表征了薄膜微观结构.获得了粒径约30nm的CdS微粒致密平整薄膜.研究结果表明,新方法具有薄膜质量好、无需使用贵金属电极、沉积速度快等优点.

Manufacture of nano-films by electrocircuit-less electric field deposition

To avoid the harmful electrode reactions such as gas evolving, electrolysis and plating which disturb the deposition process and deposited film in manufacture of nano-films by normal electric deposition, a new method of nano-film manufacture, which is called electric field deposition, was investigated in this paper. The electric field deposition equipment was designed, in which the soleplate and the deposited film will not form a close current loop with the deposition electrocircuit, and CdS nano-film was produced. STM and XRD were used to characterize the microstructure of the CdS nano-film. The smooth and compact films composed with CdS particles, which diameter was a little more than 30nm, were manufactured. It was shown that the new method has some benefits such as nano-films with high quality can be obtained and no expensive electrode materials are needed and high depositing efficiency and the deposition process.