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Li0.33La0.56TiO3薄膜电解质的结构和光电性能
引用本文:熊玉立,陈红萍,楼贤春,赵修建. Li0.33La0.56TiO3薄膜电解质的结构和光电性能[J]. 武汉理工大学学报, 2011, 0(1): 11-13,17
作者姓名:熊玉立  陈红萍  楼贤春  赵修建
作者单位:武汉理工大学硅酸盐材料工程教育部重点实验室;
基金项目:国家“973”计划(2009CB939700)
摘    要:采用射频磁控溅射法,自制Li0.33La0.56TiO3陶瓷靶材,在不同基片温度下沉积了Li0.33La0.56TiO3薄膜。利用X射线衍射仪、原子力学显微镜、电化学工作站、紫外-可见分光光度计等现代测试手段,研究了基片温度对薄膜的结构、形貌、光学和电学性能的影响。结果表明:所制备的Li0.33La0.56TiO3薄膜为非晶态结构,在可见光波段具有较高的透过率;随着基片温度从50℃升高到300℃,薄膜表面更为平整致密,离子电导率逐渐增加。

关 键 词:磁控溅射  Li0.33La0.56TiO3薄膜  基片温度

Structural and Photoelectrical Properties of Thin-film Li_(0.33)La_(0.56)TiO_3 Electrolyte
XIONG Yu-li,CHEN Hong-ping,LOU Xian-chun,ZHAO Xiu-jian. Structural and Photoelectrical Properties of Thin-film Li_(0.33)La_(0.56)TiO_3 Electrolyte[J]. Journal of Wuhan University of Technology, 2011, 0(1): 11-13,17
Authors:XIONG Yu-li  CHEN Hong-ping  LOU Xian-chun  ZHAO Xiu-jian
Affiliation:XIONG Yu-li,CHEN Hong-ping,LOU Xian-chun,ZHAO Xiu-jian(Key Laboratory for Silicate Materials Science and Engineering of Ministry of Education,Wuhan University of Technology,Wuhan 430070,China)
Abstract:Li0.33La0.56TiO3 thin films were prepared by radio-frequency magnetron sputtering at different substrate temperatures from a ceramic target of Li0.33La0.56TiO3.XRD,AFM,AC impedance spectrum,UV-Vis were utilized to investigate the influences of substrate temperature on the morphological,optical and electrochemical properties of Li0.33La0.56TiO3 thin films.The results indicate that Li0.33La0.56TiO3 thin films have amorphous structure and high transmission in the range of visible wavelength;the thin films obta...
Keywords:magnetron sputtering  Li0.33La0.56TiO3 thin film  substrate temperature  
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