Measurement of viscosity of the grain-boundary phase in hot-pressed silicon nitride |
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| Authors: | D. R. Mosher R. Raj R. Kossowsky |
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| Affiliation: | (1) Department of Mechanical Engineering, University of Colorado, USA;(2) Materials Science Section, Metallurgy and Metals Processing Department, Westinghouse Research Laboratories, Pittsburgh, Pennsylvania, USA;(3) Present address: Department of Materials Science and Engineering, Cornell University, 14853 Ithaca, New York, USA |
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| Abstract: | An internal friction technique has been used to measure the viscosity of the grain-boundary amorphous phase in commercial hot-pressed silicon nitride. The viscosity in the region of the glass transition (850 to 900° C) was approximately 5×1015 P per unit thickness (cm) of the grain boundary, with an apparant activation energy of 163 kcal mol−1. |
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