A high-power CH3F laser for plasma diagnostics |
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| Authors: | Lehecka T Peebles WA Savage RL Jr Luhmann NC Jr |
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| Affiliation: | California Univ., Los Angeles, CA; |
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| Abstract: | A high-power, optically pumped, methyl fluoride laser operating at 496 μm has been developed for plasma diagnostic applications. An output power of 100 mW has been measured directly on a calorimeter. The high-pump power utilized in this experiment has also allowed the first observation of saturation in far-infrared output power resulting from severe vibrational bottlenecking. The effect of buffer gases in relieving this bottlenecking is described and compared to a simple rate-equation model |
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