Effect of process parameter changes on the composition of magnetron sputtered and evaporated TiN and AlN films measured by UHV in-situ techniques

TiN and AlN films are deposited on HSS steel substrates in an ultrahigh vacuum magnetron system equipped with in-situ Auger electron spectroscopy (AES) and mass spectrometric sensors for plasma diagnostics. The composition of TiN_x coatings is measured by AES as a function of the N₂ pressure, the bias voltage, and the d.c. power. The flux of ionic particles impinging on the substrate surface and their energies are determined by a quadruple mass analyzer mounted behind a hole in the substrate. In addition, the reactivity of neutral nitrogen molecules in a reactive evaporation process is measured by a quartz crystal microbalance.