Effect of impurities on SIMS |
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| Authors: | JS Colligon G Kiriakidis |
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| Affiliation: | Department of Electrical Engineering, University of Salford, Salford M5 4WT, UK |
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| Abstract: | Results showing the effect of implantation of various species into copper on the secondary Cu+ ion signal are presented. Preliminary analysis indicates that both a physical change in the sample induced by the implantation and a chemical effect due to the presence of the implant species are responsible for the observed changes. |
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