Synthesis of ordered mesoporous carbon thin films at various temperatures in vapor infiltration method |
| |
Authors: | Sho Kataoka Takuji Yamamoto Yuki Inagi Akira Endo Masaru Nakaiwa Takao Ohmori |
| |
Affiliation: | National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan |
| |
Abstract: | Mesoporous carbon thin films with ordered structures were prepared by using resorcinol-surfactant self-assembly. A mixture of resorcinol, surfactant, and ethanol coated on silicon substrates was exposed to formaldehyde vapor as a cross-linking agent to form structured resorcinol/formaldehyde resin films. The films were then carbonized at 800 °C in an inert atmosphere to remove the surfactant and to obtain structured carbon materials. With this vapor infiltration method, thin films with several structures were obtained from the same precursor solution by employing different vapor infiltration temperatures. The results were interpreted from the transformation of the self-assembly during the vapor infiltration process. |
| |
Keywords: | |
本文献已被 ScienceDirect 等数据库收录! |
|