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| 热场对雾化裂解CVD沉积的薄膜厚度均匀性的影响 | |
| 引用本文： | 季振国,杨成兴,刘坤,叶志镇. 热场对雾化裂解CVD沉积的薄膜厚度均匀性的影响[J]. 材料科学与工程学报, 2003, 21(4): 494-497 |
| 作者姓名： | 季振国 杨成兴 刘坤 叶志镇 |
| 作者单位： | 浙江大学硅材料国家重点实验室,浙江,杭州,310027 |
| 基金项目： | 国家重点基础研究发展计划(973计划)，G2000 0683-06， |
| 摘 要： | 本文利用计算机程序简单模拟了圆盘状加热器和圆筒状加热器的热场分布，研究了热场对雾化裂解CVD法生长的半导体薄膜厚度均匀性的影响，并采用雾化裂解CVD技术制备了高度c轴取向的ZnO薄膜。实验结果表明利用圆筒形加热器及对衬底位置的控制可以在较小的加热器内获得相对尺寸大、厚度均匀性较好ZnO薄膜。 |
| 关 键 词： | 热场 雾化裂解 CVD沉积 半导体薄膜 厚度 均匀性 加热器 |
| 文章编号： | 1004-793X(2003)04-0494-04 |
| 修稿时间： | 2003-01-11 |
Influence of Hot Zone on the Thickness Uniformity of Thin Films Prepared by Nebulized Pyrolysis CVD |
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| JI Zhen|guo,YANG Cheng|xing,LIU Kun,YE Zhi|zhen. Influence of Hot Zone on the Thickness Uniformity of Thin Films Prepared by Nebulized Pyrolysis CVD[J]. Journal of Materials Science and Engineering, 2003, 21(4): 494-497 | |
| Authors: | JI Zhen|guo YANG Cheng|xing LIU Kun YE Zhi|zhen |
| Abstract: | Hot zone distribution of disk|like heaters and muff heaters were simulated by computer.Optimized heater shape and substrate positions were suggested according to the results of calculation.As an example,the influence of hot zone on the thickness uniformity of ZnO thin films deposited by nebulized pyrolisys CVD was studied in this paper.Experiment results show that ZnO films with relatively large area and good thickness uniformity can be prepared by control of the substrate position in the muff heater. |
| Keywords: | thin film nebulized pyrolysis hot zone thickness uniformity |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ | |