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SIMS quantification of As and In in Hg1−xCdxTe materials of different x values
Authors:Larry Wang  Lily H Zhang
Affiliation:(1) Charles Evans & Associates, 301 Chesapeake Dr., 94063 Redwood City, CA
Abstract:This paper presents a study of Secondary Ion Mass Spectrometry (SIMS) quantification of As and In in Hg1–xCdxTe materials. The SIMS results show that for Hg1-xCdxTe with x from 0.2 to 0.8, As and In quantification is independent of the x-values (0.2–0.8). The relative sensitivity factors (RSF) for In and As derived from the standard of one x value can be used to accurately quantify unknown samples of different x value(s). We also determined the dependence of sputtering rate vs. x values under oxygen beam bombardment.
Keywords:SIMS  Hg1−  xCdxTe  In  As  characterization  dopant  RSF
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