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新型MSIS结构气敏电容的研究
引用本文:田敬民.新型MSIS结构气敏电容的研究[J].固体电子学研究与进展,1996,16(3):284-288.
作者姓名:田敬民
作者单位:西安理工大学,微电子技术教研室
摘    要:采用静电喷雾高温分解工艺制备SnO2气敏膜,并与Si3N4-SiO2集成多层介质膜,用催化金属Pt作栅电极,制成新型的MSIS结构气敏电容。通过检测平带电压的变化,研究对H2和O2的气敏特性,分析其气敏机理并提出了检测的物理模型.

关 键 词:二氧化锡,气敏电容,金属-氧化物半导体-绝缘层-硅结构

Study on a Novel MSIS Gas Sensing Capacitor
Tian Jingmin.Study on a Novel MSIS Gas Sensing Capacitor[J].Research & Progress of Solid State Electronics,1996,16(3):284-288.
Authors:Tian Jingmin
Abstract:Catalytic metal Pt and SnO2 film deposited by using electrostatic spray pyrolysis process were integreted in a Pt-SnO2-Si3N4-SiO2-Si MSIS capacitor.The sensing characteristics of the devices for H2 and O2 as a function of the gas concentration and temperature were researched by detection of flantband voltage of the MSIS. Based on adsorption reaction of oxygen ions at Pt-SnO2 interface,a model is proposed for hydrogen and oxygen detection.
Keywords:Tin Oxide  Gas Sensing Capacitior  MSIS Structure
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