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Nonnull interferometer simulation for aspheric testing based on ray tracing
Authors:Tian Chao  Yang Yongying  Wei Tao  Zhuo Yongmo
Affiliation:State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, 38 Zheda Road, Hangzhou 310027, China.
Abstract:The nonnull interferometric method that employs a partial compensation system to compensate for the longitude aberration of the aspheric under test and a reverse optimization procedure to correct retrace errors is a useful technique for general aspheric testing. However, accurate system modeling and simulation are required to correct retrace errors and reconstruct fabrication error of the aspheric. Here, we propose a ray-tracing-based method to simulate the nonnull interferometer, which calculates the optical path difference by tracing rays through the reference path and the test path. To model a nonrotationally symmetric fabrication error, we mathematically represent it with a set of Zernike polynomials (i.e., Zernike deformation) and derive ray-tracing formulas for the deformed surface, which can also deal with misalignment situations (i.e., a surface with tilts and/or decenters) and thus facilitates system modeling extremely. Simulation results of systems with (relatively) large and small Zernike deformations and their comparisons with the lens design program Zemax have demonstrated the correctness and effectiveness of the method.
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