Tunable contact resistance in double-gate organic field-effect transistors

A study of the contact resistance (R_sd) in pentacene-based double-gate transistors is presented. In top-contact transistors, as the negative bias of the additional top-gate bias is increased, R_sd decreases by over five orders of magnitude for small bottom-gate voltages. In bottom-contact transistors, R_sd is reduced by about ten times for all bias values, implying improved charge transport in all operating regimes. The different tunability of R_sd in top/bottom-contact transistors is attributed to different charge injection modulation by the coplanar/staggered top gate. Therefore, double-gate architecture offers a novel and effective approach to limit R_sd and its relevant impacts on organic transistor.