| 18.2nm Schwarzschild显微物镜用多层膜带宽匹配问题分析 |
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| 引用本文： | 王占山.18.2nm Schwarzschild显微物镜用多层膜带宽匹配问题分析[J].光学精密工程,1999,7(3):14-18. |
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| 作者姓名： | 王占山 |
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| 作者单位： | 中国科学院长春光学精密机械研究所应用光学国家重点实验室 |
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| 基金项目： | 国家自然科学基金,吉林省科委青年基金 |
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| 摘 要： | 软X射线多层膜的进展使正入射高分辨率成像系统从红外、可见和紫外扩展到软X射线波段。由于软X射线多层膜的反射率还不能像其它波段反射镜反射率那样高,因此由两块同心球面反射镜组成的Schwarzschild物镜在软X射线波段得到了广泛的应用。本文从多层膜带宽匹配条件、Schwarzschild显微物镜的几何尺寸和多层膜镀制设备的性能出发,研究了实现Schwarzschild显微物镜带宽匹配条件的镀膜过程,为实际制备Schwarzschild显微物镜用多层膜提供理论指导。
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| 关 键 词： | 软X射线多层膜 Schwarzschild物镜 带宽匹配 |
| 收稿时间： | 1999-02-08 |
| 修稿时间： | 1999-02-08 |
The Analysis of Multilayer Waveband Matching for Schwarzschild Objective Working at 18.2nm |
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| WANG Zhan,Shan.The Analysis of Multilayer Waveband Matching for Schwarzschild Objective Working at 18.2nm[J].Optics and Precision Engineering,1999,7(3):14-18. |
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| Authors: | WANG Zhan Shan |
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| Affiliation: | The State Key Laboratory of Applied Optics, Changchun Institute of Optics and Fine Mechanics, Chinese Academy of sciences, Changchun 130022 |
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| Abstract: | The developments of multilayers make normal incidence imaging systems with high resolution from wavelength range of infrared, visible and ultraviolet to soft X ray. The Schwarzschild objective which consists of two concentric mirrors is extensively used in soft X ray range because the reflectivity of multilayers is lower than that in other range. Combining the waveband matching condition with the configuration of Schwarzschild objective and performance of magnetron sputtering instrument, the multilayer coating process is analyzed for completing fabrication of multilayers using in 18.2nm Schwarzschild objective. The theoretic suggestion is supplied for making multilayers meeting with waveband matching condition. |
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| Keywords: | Soft X ray multilayer Schwarzschild objective Waveband matching |
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