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Fabrication and characterization of SiO2(f)/Si3N4 composites
引用本文:Yongsheng Liu Laifei Cheng Litong Zhang Yongdong Xu Yi Liu. Fabrication and characterization of SiO2(f)/Si3N4 composites[J]. 北京科技大学学报(英文版), 2007, 14(5): 454-459. DOI: 10.1016/S1005-8850(07)60089-9
作者姓名:Yongsheng Liu Laifei Cheng Litong Zhang Yongdong Xu Yi Liu
作者单位:Yongsheng Liu,Laifei Cheng,Litong Zhang,Yongdong Xu,and Yi Liu National Key Laboratory of Thermostructure Composite Materials,Northwestern Polytechnical University,Xi’an 710072,China
基金项目:国家自然科学基金,国家自然科学基金,西北工业大学校科研和教改项目
摘    要:
A silicon dioxide fiber-reinforced silicon nitride matrix (SiO2/Si3N4) composite used for radomes was prepared by chemi- cal vapor infiltration (CVI) process using the SiCl4-NH3-H2 system. The effects of the process conditions, including infiltration tem- perature, infiltration time, and gas flux were investigated. The energy dispersion spectra (EDS) result showed that the main elements of this composite contained Si, N, and O. The X-ray diffraction (XRD) results indicated that phases of the composite before and after treatment at 1350°C were all amorphous. A little fiber pull-out was observed on the cross section of the composite by scan electron microscope (SEM). As a result, the composite exhibited good thermal stability, but an appropriate interface was necessary between the fiber and the matrix.

关 键 词:SiO2 Si3N4 复合物 化学蒸汽渗透 表面特征
收稿时间:2006-09-12
修稿时间:2006-09-12

Fabrication and characterization of SiO2(f)/Si3N4 composites
Yongsheng Liu,Laifei Cheng,Litong Zhang,Yongdong Xu,Yi Liu. Fabrication and characterization of SiO2(f)/Si3N4 composites[J]. Journal of University of Science and Technology Beijing, 2007, 14(5): 454-459. DOI: 10.1016/S1005-8850(07)60089-9
Authors:Yongsheng Liu  Laifei Cheng  Litong Zhang  Yongdong Xu  Yi Liu
Affiliation:National Key Laboratory of Thermostructure Composite Materials, Northwestern Polytechnical University, Xi'an 710072, China
Abstract:
A silicon dioxide fiber-reinforced silicon nitride matrix (SiO2/Si3N4) composite used for radomes was prepared by chemical vapor infiltration (CVI) process using the SiCl4-NH3-H2 system. The effects of the process conditions, including infiltration temperature, infiltration time, and gas flux were investigated. The energy dispersion spectra (EDS) result showed that the main elements of this composite contained Si, N, and O. The X-ray diffraction (XRD) results indicated that phases of the composite before and after treatment at 1350℃ were all amorphous. A little fiber pull-out was observed on the cross section of the composite by scan electron microscope (SEM). As a result, the composite exhibited good thermal stability, but an appropriate interface was necessary between the fiber and the matrix.
Keywords:SiO2/Si3N4 composite  fabrication  characterization  chemical vapor infiltration
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