激光诱导化学反应刻蚀石英玻璃的实验研究

针对目前常用的超短脉冲激光加工、激光诱导等离子加工、纳秒紫外激光加工石英玻璃刻蚀率低下的问题,提出一种能够大范围、高刻蚀率、低裂损刻蚀石英玻璃的新方法,即利用1064nm红外激光诱导Ba(OH)2化学反应刻蚀。本文主要从不同能量密度激光诱导化学反应刻蚀机理进行分析,实验表明,当激光能量密度超过16 J/cm2时,石英玻璃被刻蚀;当激光能量密度在16~24 J/cm2之间时,仅物理作用去蚀石英玻璃,故刻蚀率随激光能量变化较小；当激光能量密度在24~42 J/cm2之间时,刻蚀率随激光能量密度变化较大,该阶段Ba(OH)2以及其分解生成的BaO在高温条件下都与石英玻璃主要成分SiO2发生化学反应并生成BaSiO3,故刻蚀率较高；激光能量密度在42~46 J/cm2时,化学反应速率趋于饱和,故该阶段刻蚀率随激光能量密度变化较小。

Study on quartz glass etched by laser induced chemical reactio

As the common laser processing methods such as ultrashort pulse laser processing,laser induced plasma processing,nanosecond ultraviolet laser processing have low corrosion rate for quartz glass,a new etching method for quartz glass is proposed,and it has the characteristics of wide range,high corrosion rate and low fracture.The etching mechanism of laser induced chemical reaction with different energy densities was analyzed.The experiment shows that the quartz glass can be etched when the laser energy density is more than 16 J/cm2.When the laser energy density is between 16~24 J/cm2,quartz glass is corroded by the only physical mechanism,thus,the change of etching rate is low with the change of laser energy density.When the laser energy density is between 24~42 J/cm2,the change of etching rate with the increasing of laser energy density is comparatively large.The main reason is that the chemical reaction of SiO2 with both Ba(OH)2 and BaO are generated at high temperature and BaSiO3 is produced.When the laser density is between 41~46 J/cm2,the rate of chemical reaction is nearly maximum,so the etching rate increases slightly with the increase of laser energy density.