| Abstract: | Optical film thickness monitoring is more precise than crystal monitoring. The optical measurement makes use of the fact that the intensity of a monochromatic light beam which is reflected on a film will change periodically with increasing film thickness. The measurement is performed at an exchangeable test glass that is positioned beside the substrates and is therefore coated in the same way as the substrates. The accuracy of cut‐off is achieved by a “fit” of a theoretical curve shape to the measured values. Order filters are used to ensure that, at a certain wavelength, higher deflection orders do not influence the measurement when a monochromator grating is used. |
