大型等离子处理设备真空系统设计

为使大尺寸印制板能够进行低温等离子处理,设计了大型等离子处理设备,该设备具有真空度可调的真空系统、电极可冷却的电源系统及基于可编程逻辑控制器(Programmable Logic Control,PLC)和触摸屏的控制系统。文中简要介绍了大型等离子处理设备的组成及工作方式,详细阐述了真空系统设计,包括真空泵组选型计算和基于有限元的真空腔体结构优化设计。实践证明,该设备具有等离子体产生速度快、腔体温度控制效果好等特点,达到了国内领先水平。

Design of Vacuum System of Large Plasma Processing Equipment

In order to enable the big size PCB to carry out low-temperature plasma processing, the large plasma processing equipment is designed. The equipment is composed of the vacuum system with adjustable vacuum degree, the power system with the cooling electrode and the control system based on programmable logic control （PLC） and human machine interface （HMI）. The composition and operation modes of the large plasma processing equipment are introduced briefly in this paper. The design of vacuum system including the selection ＆ calculation of the vacuum pumps and the optimization of vacuum cavity structure based on finite element is described in detail. Practice shows that the equipment can produce plasma fast and control the chamber temperature effectively.