Performance characteristics of an injection-controlledelectron-beam pumped XeF(C→A) laser system

Characteristics of an injection-controlled electron-beam pumped XeF(C→A) laser are investigated with emphasis on efficient wideband tuning and scaling issues. Using a quasi-CW dye laser as an injection source, data are obtained that describe the laser characteristics over a wide parameter range. A high-Z electron-beam backscattering reflector inside the laser reaction cell improved the electron-beam energy deposition by 40%, resulting in an increase of the amplified laser output by more than a factor of four. Efficient and continuous wavelength tuning between 470 and 500 nm is achieved with an output energy density of ~1 J/l, and an intrinsic efficiency of ~1% throughout the entire tuning region