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高低压兼容单片CMOS驱动器的设计
引用本文:庄庆德,童勤义,陈德英,唐国洪.高低压兼容单片CMOS驱动器的设计[J].微电子学,1988(1).
作者姓名:庄庆德  童勤义  陈德英  唐国洪
作者单位:南京工学院微电子中心 (庄庆德,童勤义,陈德英),南京工学院微电子中心(唐国洪)
摘    要:采用标准n阱硅栅等平面CMOS工艺,将耐压大于200V、吸收电流大于200mA的高压功率VMOS器件与工作在5V电源电压的CMOS控制电路兼容在同一个硅芯片上。分析了电路设计及工艺措施,证明这种技术可以低成本地制作各种低高压兼容电路。

关 键 词:功率器件  驱动器  CMOS工艺

The Design of a High/Low Voltage Compatable Monolithic CMOS Driver
Qingde Zhuang,Qingyi Tong,Deying Chen and Guohong Tang.The Design of a High/Low Voltage Compatable Monolithic CMOS Driver[J].Microelectronics,1988(1).
Authors:Qingde Zhuang  Qingyi Tong  Deying Chen and Guohong Tang
Affiliation:Microelectronics Center of Nanjing Institute of Technology
Abstract:Using standard n-well Si-gate isoplanar CMOS process, a compatable monolithic IC is made, into which an NMOS high-voltage power device with working voltage up to 200V and sink current over 200mA and a CMOS control circuit operating at 5V supply voltage is integrated. An analysis of the design of the circuit and the processing steps is made.It is demonstrated that different high/low voltage compatable circuits can be fabricated at low cost using this technology.
Keywords:power device driver  CMOS process
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