| Si-N-O薄膜结构对薄膜血液相容性的影响 |
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| 引用本文： | 王起义,杨苹,郑楠,黄菊,孙鸿,黄楠.Si-N-O薄膜结构对薄膜血液相容性的影响[J].功能材料,2009,40(5). |
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| 作者姓名： | 王起义 杨苹 郑楠 黄菊 孙鸿 黄楠 |
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| 作者单位： | 西南交通大学,材料科学与工程学院,材料先进技术教育部重点实验室,四川,成都,610031 |
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| 基金项目： | 国家自然科学基金资助项目(30570502) |
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| 摘 要： | 采用非平衡磁控溅射(UBMS450)法在(100)单晶硅表面制备Si-N-O薄膜.利用X射线光电子能谱(XPS)表征薄膜的成分结构;用血小板粘附试验表征薄膜结构对薄膜血液相容性的影响.研究结果表明,以无机Si为主的Si-N-O薄膜,其血液相容性较差;键合少量O的Si3N4薄膜,其血液相容性较佳.Si-N-O薄膜中N含量和O含量的变化,是导致薄膜结构变化的重要因素.
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| 关 键 词： | Si-N-O薄膜 血液相容性 磁控溅射 |
Influence of Si-N-O films structure on their hemocompatibility |
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| WANG Qi-yi
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YANG Ping
,
ZHENG Nan
,
HUANG Ju
,
SUN Hong
,
HUANG Nan.Influence of Si-N-O films structure on their hemocompatibility[J].Journal of Functional Materials,2009,40(5). |
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| Authors: | WANG Qi-yi YANG Ping ZHENG Nan HUANG Ju SUN Hong HUANG Nan |
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| Affiliation: | School of Materials Science and Technology of Southwest Jiaotong University;Key Lab.of Advanced Technology for Materials of Education Ministry;Chengdu 610031;China |
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| Abstract: | Silicon oxynitride(Si-N-O) films were prepared on the surface of monocrystalline silicon(100) by unbalance magnetron sputtering(UBMS).The chemical composition and structure were characterized by X-ray photoelectron spectrometry(XPS);the influence of films structure on their hemocompatibility was evaluated by platelet adhesion tests.Results indicated that the film structure was influenced significantly by the N content and the O content.The film structure dominated by Si had worse hemocompatibility;the film ... |
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| Keywords: | Si-N-O film hemocompatibility magnetron sputtering |
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