| C轴择优取向ZnO薄膜的溅射工艺与结构研究 |
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| 引用本文： | 贺洪波,范正修. C轴择优取向ZnO薄膜的溅射工艺与结构研究[J]. 功能材料, 2000, 31(Z1): 77-78 |
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| 作者姓名： | 贺洪波 范正修 |
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| 作者单位： | 贺洪波（中国科学院上海光学精密机械研究所薄膜技术中心,上海 201800）;范正修（中国科学院上海光学精密机械研究所薄膜技术中心,上海 201800） |
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| 摘 要： | 通过改变直流磁控反应溅射法的工艺条件,同时在玻璃和Si(100)、Si(111)两种硅基底上制备了ZnO薄膜。用x射线衍射方法(xRD和xRC)对薄膜结构性能进行测试表明,这些基底上生长的ZnO薄膜都得到了明显的c轴择优取向和较高的结晶度,硅基底上的薄膜结构性能普遍好于玻璃基底上淀积的薄膜。并对溅射工艺与结构的关系进行了分析。
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| 关 键 词： | 直流磁控溅射 ZnO薄膜 择优取向 结构性能 |
| 文章编号： | 1001-9731(2000)zk刊-0077-02 |
| 修稿时间： | 1998-11-16 |
A Study on Sputtering Process and Structure of Preferred C- Orientation ZnO Thin Films |
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| HE Hongbo,FAN Zhengxiu. A Study on Sputtering Process and Structure of Preferred C- Orientation ZnO Thin Films[J]. Journal of Functional Materials, 2000, 31(Z1): 77-78 |
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| Authors: | HE Hongbo FAN Zhengxiu |
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| Abstract: | Reactive d.c. magnetron sputtering was adopted to prepare ZnO thin films on glass,Si(100) and Si(111) substrates.Structural properties were then valued by X-ray diffraction and X-ray rocking curve to show that these ZnO films were all with high crystallinity and had a very strong preferred orientation along the c axis normal to the substrate surface.But the structural properties of ZnO films on Si substrates were generally better than that of ZnO films on glass.Moreover,the dependence of structure on sputtering process was also studied. |
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| Keywords: | dc magnetron sputtering ZnO thin films preferred orientation structural properties |
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