电子束蒸发法制备掺钇稳定氧化锆薄膜的光学特性研究

利用电子束蒸镀方法在单晶硅和石英玻璃上制备了掺不同Y_2O_3浓度的掺钇稳定ZrO_2薄膜(YSZ),用X射线衍射、原子力显微镜、扫描电子显微镜和透射光谱测定薄膜的结构、表面特性和光学性能,研究了退火对薄膜结构和光学性能的影响.结果表明:一定浓度的Y_2O_3掺杂可以使ZrO_2薄膜稳定在四方相,退火显著影响薄膜结构,随着温度的升高薄膜结构依次经历由非晶到四方相再到四方和单斜混合相转变;AFM分析显示薄膜表面YSZ颗粒随着退火温度的升高逐渐增大,表面粗糙度相应增大,晶粒大小计算表明,退火温度的提高有助于薄膜的结晶化,退火温度从400℃到1100℃变化范围内晶粒大小从15.6nm增大到46.3nm;同时利用纳秒激光对薄膜进行了破坏阈值测量,结果表明电子束蒸镀制备YSZ薄膜是一种制备高抗激光损伤镀层的有效方法.

Optical Properties of Electron Beam Evaporated Y-Doped ZrO_2 Films

The ZrO_2 films,doped with different contents of Y_2O_3,were grown by electron beam evaporation.Its microstructures and optical propertied were characterized with X-ray diffraction (XRD),scanning electron microscopy (SEM),and atomic force microscopy (AFM).The influence of the film growth conditions on its properties was studied.The results show that the annealing temperature strongly affects the microstructures of the ZrO_2 films stabilized with proper Y_2O_3,content.For instance,as the temperature rises up,the amorphous phase of ZrO_2 changes into tetragonal phase,ending up with a monoclinic phase;and the grain sizes also inerease,roughening the film surfaces.The pulsed,nano-second laser irradiation little affects the surface morphology of the ZrO_2 films,which can be a promising anti damage material.