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Characterization of CdTe/Hg1−xCdxTe heterostructures by high-resolution x-ray diffraction
Authors:N. Mainzer  D. Shilo  E. Zolotoyabko  G. Bahir  A. Sher
Affiliation:(1) Faculty of Materials Engineering, Technion — Israel Institute of Technology, 32000 Haifa, Israel;(2) Technion — Israel Institute of Technology, 32000 Haifa, Israel;(3) SCD-Semiconductor Devices, P.O. Box 2250/99, 31021 Haifa, Israel;(4) Department of Solid State Physics, Soreq NRC, 81800 Yavne, Israel
Abstract:CdTe/Hg1−xCdxTe heterostructures variously heat-treated and implanted with boron were studied by means of high-resolution x-ray diffraction. A novel procedure for simulating diffraction spectra was developed, which is based on direct summation of scattered waves across a heterostructure. In that routine, short-range variations of structural parameters, including concentration of the components, can be taken into account. The new approach allows precise characterization of II–VI heterostructures, because it correctly treats atomic diffusion effects in diffraction spectra. As a result, subtle spectral modifications induced by boron implantation could be detected and were attributed to the dynamics of post implantation point defects.
Keywords:CdTe/Hg1−  xCdxTe  heterostructure  implantation  x-ray diffraction
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