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酸增殖源及其在化学增幅抗蚀剂体系中的应用
引用本文:周庆莉,曹胜利,张存林. 酸增殖源及其在化学增幅抗蚀剂体系中的应用[J]. 信息记录材料, 2003, 4(1): 7-10
作者姓名:周庆莉  曹胜利  张存林
作者单位:首都师范大学,物理系,北京,100037
基金项目:北京市自然科学基金 ( 2 0 2 2 0 0 6)
摘    要:介绍了酸增殖机理、酸增殖源的种类、典型化合物在化学增幅抗蚀剂体系中的应用及对灵敏度的提高 ,提出在计算机直接制版版材研究中的应用

关 键 词:酸增殖  酸增殖源  化学增幅抗蚀剂
文章编号:1009-5624(2003)01-0007-04

Acid Proliferation Generator and Its Application in Chemically Amplified Photoresist
ZHOU Qing li,CAO Sheng li,ZHANG Cun lin. Acid Proliferation Generator and Its Application in Chemically Amplified Photoresist[J]. Information Recording Materials, 2003, 4(1): 7-10
Authors:ZHOU Qing li  CAO Sheng li  ZHANG Cun lin
Abstract:The mechanism of acid proliferation and the classification of acid proliferation generators are introduced.The application of some typical compounds of acid proliferation generators in chemically amplified photoresist,leading to enhancement of sensitivity,is also introduced.The application of acid proliferation in the preparation of Computer to Plate is proposed.
Keywords:acid proliferation  acid proliferation generator  chemically amplified photoresist
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