| The even device fabricated by the deep etched binary optics technology for the exposure system of the quasi-molecule laser |
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| 作者姓名： | 徐平 孙一翎 李景镇 |
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| 作者单位： | XU Ping SUN Yiling & LI JingzhenPhotoelectron Technology & Engineering Department of Science & Technology Institute，Shenzhen University，Guangdong，Shenzhen 518060，China |
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| 基金项目： | This work was supported by the National Natural Science Founation of China，the Science and Technology Fund of Shenzhen. |
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| 摘 要： | By applying the specific properties and the fabricating technology of the deep etched elements presented by us, the even device of deep etched binary optics has been designed and fabricated which can be used in quasi-molecule laser exposure system. This even device is light in weight, easy to adjust and has a high utilization rate of energy and is able to project well-distributed light beams. So it is better than the conventional one which was an array made up of quartz sticks. The properties and designed parameters were studied and simulated. The fabricated even was precisely tested by high precision Alpha-Steper. The testing result of the surface relief structures of the even has been profoundly analyzed by introducing "boundary errors". The theory agrees well with the results of the experiment. This is the first successful application of the deep etched theory and technology of binary optics to the exposure system of microfabrication.
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| 收稿时间： | 6 September 2006 |
The even device fabricated by the deep etched binary optics technology for the exposure system of the quasi-molecule laser |
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| Ping Xu, Yiling Sun and Jingzhen Li.The even device fabricated by the deep etched binary optics technology for the exposure system of the quasi-molecule laser[J].Science in China(Technological Sciences),2002,45(1):1-9. |
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| Authors: | Ping Xu Yiling Sun and Jingzhen Li |
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| Affiliation: | Photoelectron Technology & Engineering Department of Science & Technology Institute, Shenzhen University, Guangdong, Shenzhen 518060, China |
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| Abstract: | By applying the specific properties and the fabricating technology of the deep etched elements presented by us, the even device of deep etched binary optics has been designed and fabricated which can be used in quasi-molecule laser exposure system. This even device is light in weight, easy to adjust and has a high utilization rate of energy and is able to project well-distributed light beams. So it is better than the conventional one which was an array made up of quartz sticks. The properties and designed parameters were studied and simulated. The fabricated even was precisely tested by high precision Alpha-Steper. The testing result of the surface relief structures of the even has been profoundly analyzed by introducing "boundary errors". The theory agrees well with the results of the experiment. This is the first successful application of the deep etched theory and technology of binary optics to the exposure system of microfabrication. |
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| Keywords: | deep etched binary optics element even device error analysis |
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