Development of low-energy and high-current-density ion beam system |
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Authors: | Sakakita H Kiyama S Hirano Y Koguchi H Shimada T Sato Y |
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Affiliation: | Innovative Plasma Technologies Group, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8568, Japan. h.sakakita@aist.go.jp |
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Abstract: | A low-energy ion beam system operating at a dc voltage of less than 300 V was developed using an ion source with a multicusp magnetic field. A high-current-density ion beam of 6.9 mA∕cm(2) was successfully extracted at the electrode. The beam extraction characteristics for flat and concave electrodes were compared. In the case of a concave electrode with a designed focal length of 350 mm, it was observed that the beam profile was sharper than that obtained using a flat electrode. |
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