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极坐标激光直写技术制作微结构
引用本文:王多书,罗崇泰,陈 焘,刘宏开,马勉军 黄良甫.极坐标激光直写技术制作微结构[J].激光与红外,2006,36(7):525-528.
作者姓名:王多书  罗崇泰  陈 焘  刘宏开  马勉军 黄良甫
作者单位:兰州物理研究所,甘肃,兰州,730000
摘    要:简述了极坐标激光直写技术原理,并利用该技术研究了在铬板、光刻胶版表面制作微 结构的工艺,制作了光栅、非涅耳透镜、曲面衍射透镜、平面连续微结构衍射透镜掩模以及基于MEMS技术的微型太阳敏感器光学掩模。

关 键 词:激光直写技术  掩模  微结构  微光学
文章编号:1001-5078(2006)07-0525-04
收稿时间:2005-12-08
修稿时间:2005-12-082006-02-16

Micro-structure Fabrication with Circular Laser Writing Technology
WANG Duo-shu,LUO Chong-tai,CHEN Tao,LIU Hong-kai,MA Mian-jun,HUANG Liang-fu.Micro-structure Fabrication with Circular Laser Writing Technology[J].Laser & Infrared,2006,36(7):525-528.
Authors:WANG Duo-shu  LUO Chong-tai  CHEN Tao  LIU Hong-kai  MA Mian-jun  HUANG Liang-fu
Affiliation:Lanzhou Institute of Physics, Lanzhou 730000, China
Abstract:Theory of the circular laser writing technology was described, and the technology for fabrication of microstructure on the chrome and photoresist mask was studied. Grating, spherical surface diffractive lens and mask of plane diffractive lenswith continuous relief structure were fabricated using the technology. The op ticalmask of the micro sun sensor based on theMEMS technology was also fabricated.
Keywords:laser writing technology  mask  micro-structure  micro optics
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