| 磁控溅射Ta-C-N薄膜摩擦学性能研究 |
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| 引用本文： | 严学华,尹君,程晓农.磁控溅射Ta-C-N薄膜摩擦学性能研究[J].硅酸盐通报,2012,31(2):271-274,284. |
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| 作者姓名： | 严学华 尹君 程晓农 |
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| 作者单位： | 江苏大学材料科学与工程学院,镇江,212013 |
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| 基金项目： | 江苏省自然基金，江苏省高校自然科学重大基础研究，江苏省青蓝工程和六大人才高峰资助项目 |
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| 摘 要： | 采用磁控溅射法在Si基片上沉积非晶态Ta-C-N薄膜。利用纳米压痕仪表征其纳米硬度和弹性模量;摩擦磨损实验检测其摩擦学性能;光学轮廓仪和扫描电镜观察磨痕形貌。结果表明:Ta-C-N薄膜具有较高的纳米硬度9.45 GPa和弹性模量225.71 GPa,同时具有较低的摩擦系数0.238,磨损率5.94×10-6 mm3.N-1.m-1,磨面较为平整光滑,体现了优越的摩擦磨损性能。
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| 关 键 词： | 薄膜 纳米硬度 弹性模量 摩擦系数 磨损 |
Tribological Properties of Ta-C-N Thin Film Deposited by Magnetron Sputtering |
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| YAN Xue-hua
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YIN Jun
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CHENG Xiao-nong.Tribological Properties of Ta-C-N Thin Film Deposited by Magnetron Sputtering[J].Bulletin of the Chinese Ceramic Society,2012,31(2):271-274,284. |
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| Authors: | YAN Xue-hua YIN Jun CHENG Xiao-nong |
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| Affiliation: | (School of Materials Science and Engineering,Jiangsu University,Zhenjiang 212013,China) |
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| Abstract: | The amorphous Ta-C-N thin film was deposited by DC magnetron sputtering on silicon wafer.The as-prepared thin films were characterized by scanning electron microscope(SEM),optical profiling system,nanoindentation and friction test instruments.The results show that the Ta-C-N thin film has high nano-hardness and elastic modulus,which is 9.45 GPa and 225.71 GPa,respectively.Furthermore,the low friction coefficient and wear rate of the Ta-C-N thin film is 0.238 and 5.94×10-6 mm3·N-1·m-1,respectively.The wear surface of Ta-C-N thin film is smooth and it shows good anti-wear properties. |
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| Keywords: | thin film nano-hardness elastic modulus friction coefficient wear |
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