|
|||||
|
|
A Si stencil mask for deep X-ray lithography fabricated by MEMS technology |
|
| Authors: | Harutaka Mekaru Takayuki Takano Yoshiaki Ukita Yuichi Utsumi Masaharu Takahashi |
| Affiliation: | 1. Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology, 1-2-1 Namiki, Tsukuba, Ibaraki, 305-8564, Japan 2. Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, kamigori-cho, Ako-gun, Hyogo, 678-1205, Japan |
| Abstract: | |
| Keywords: | |
| 本文献已被 SpringerLink 等数据库收录！ | |