Ion beam mixing characteristics of MOCVD grown InGaAs/GaAs superlattices |
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Authors: | D. V. Forbes J. J. Coleman J. K. Klatt R. S. Averback |
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Affiliation: | (1) Materials Research Laboratory and Microelectronics Laboratory, University of Illinois at Urbana-Champaign Urbana, 61801, IL;(2) Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign, 61801 Urbana, IL |
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Abstract: | The ion beam mixing behavior of InGaAs/GaAs strained layer superlattice structures grown by metalorganic chemical vapor deposition was studied using secondary ion mass spectroscopy and Rutherford backscattering channeling. The fluence dependence of intermixing by MeV Kr+ irradiation has been investigated. Significant intermixing occurs for fluences much lower than for similar intermixing in other superlattice systems (i.e. ALAs/GaAs). The intermixing exhibits no temperature dependence for fluences of 2 x 1015 to 5 x 1015 cm−2 which sharply contrasts with the behavior of the AlAs/GaAs superlattice system which shows a strong temperature dependence, including a miscibility gap, in the temperature range 523 to 973K. Samples irradiated at 573K retain a high degree of crystallinity when compared to lower temperature irradiations indicating that the InGaAs/GaAs superlattice can be disordered and still retain crystallinity. |
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Keywords: | InGaAs/GaAs metalorganic chemical vapor deposition (MOCVD) Rutherford backscattering (RBS) secondary ion mass spectroscopy (SIMS) superlattice |
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