Yttrium oxide film deposition by a Langmuir-Blodgett processing technique and its incorpiration into oxide scales by substrate oxidation

Thin films (about 10 nm) of Y₂O₃ have been deposited by a Langmuir-Blodgett processing technique onto a variety of substrates: type 304 stainless steel, low carbon steel, titanium, zirconium and silicon. The substrates were afterwards oxidized in air at 800, 1000 (304 steel), 400 (low C steel), 500 (Ti), 450 (Zr) and 1000 (Si) °C. The effects of the film on the oxide scale thickness and the interaction between Y₂O₃ and the oxide of the substrate have been studied by ion backscattering. In stainless steel, the Y₂O₃ film reduces the oxidation rate by orders of magnitude and Y is distributed throughout the oxide scalw (1–10 at.% level). In other substrates, the effect on oxidation rate was less pronounced, but changes in the visual appearance often took place. The Y₂O₃ incorporation varied for the different substrates, and Y₂O₃ remained as a surface film in the cases of Ti and Si. Such films exhibited good adherence and could not be removed by wiping. The potential use of metal oxide thin films for surface analysis standards and diffusion marker studies is discussed.